The Physical Vapor Deposition (PVD) materials - OXIDES are useful as basic materials for production by thermal evaporation, deposition by electron-beam or by ion-plasma evaporation of transparent thin-film coatings, which improve the optical characteristics of workpieces made of glass, quartz, single crystals, semiconductors, etc. Used for deposition of mono- and multilayer optical coatings, they are highly effective in ultraviolet, visible and infrared spectral regions.
     Antireflective (AR) coatings reduce reflections and ghost images while enhancing the transmission of light. This is especially important when a large number of surfaces are used, as in microscopes, camera lenses or endoscopes. Besides antireflective coatings, a wide range of applications are served in the UV, visible and infrared range, in lighting systems, laser technology, projection systems, and even in medical applications such as mirrors, band-pass filters for information technology, coatings for displays, and more.
     The OXIDES film-forming materials are deliverable in form of tablets or granules, based on high-pure metal compounds. PVD processing is carried out in high vacuum at temperatures between 150 and 500 °C.

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